The GRADAR Procedure |
Procedure features: | Data set generation |
Sample library member: | GRRDATA |
Most of the GRADAR procedure examples use the FAILURE data set. You must submit this code before you can run any of the examples that use the FAILURE data set.
During the manufacture of a metal-oxide semiconductor (MOS) capacitor, different cleaning processes were used by two manufacturing systems that were operating in parallel. Process A used a standard cleaning solution, while Process B used a different cleaning mixture that contained less particulate matter. For five consecutive days the causes of failure with each process were observed, recorded, and saved in the SAS data set called FAILURE.
data failure; label Cause = "Cause of Failure" ; input Process $ 1-9 Day $ 13-19 Cause $ 23-36 Count 40-41; datalines; Process A March 1 Contamination 15 Process A March 1 Corrosion 2 Process A March 1 Doping 1 Process A March 1 Metallization 2 Process A March 1 Miscellaneous 3 Process A March 1 Oxide Defect 8 Process A March 1 Silicon Defect 1 Process A March 2 Contamination 16 Process A March 2 Corrosion 3 Process A March 2 Doping 1 Process A March 2 Metallization 3 Process A March 2 Miscellaneous 1 Process A March 2 Oxide Defect 9 Process A March 2 Silicon Defect 2 Process A March 3 Contamination 20 Process A March 3 Corrosion 1 Process A March 3 Doping 1 Process A March 3 Metallization 0 Process A March 3 Miscellaneous 3 Process A March 3 Oxide Defect 7 Process A March 3 Silicon Defect 2 Process A March 4 Contamination 12 Process A March 4 Corrosion 1 Process A March 4 Doping 1 Process A March 4 Metallization 0 Process A March 4 Miscellaneous 0 Process A March 4 Oxide Defect 10 Process A March 4 Silicon Defect 1 Process A March 5 Contamination 23 Process A March 5 Corrosion 1 Process A March 5 Doping 1 Process A March 5 Metallization 0 Process A March 5 Miscellaneous 1 Process A March 5 Oxide Defect 8 Process A March 5 Silicon Defect 2 Process B March 1 Contamination 8 Process B March 1 Corrosion 2 Process B March 1 Doping 1 Process B March 1 Metallization 4 Process B March 1 Miscellaneous 2 Process B March 1 Oxide Defect 10 Process B March 1 Silicon Defect 3 Process B March 2 Contamination 9 Process B March 2 Corrosion 0 Process B March 2 Doping 1 Process B March 2 Metallization 2 Process B March 2 Miscellaneous 4 Process B March 2 Oxide Defect 9 Process B March 2 Silicon Defect 2 Process B March 3 Contamination 4 Process B March 3 Corrosion 1 Process B March 3 Doping 1 Process B March 3 Metallization 0 Process B March 3 Miscellaneous 0 Process B March 3 Oxide Defect 10 Process B March 3 Silicon Defect 1 Process B March 4 Contamination 2 Process B March 4 Corrosion 2 Process B March 4 Doping 1 Process B March 4 Metallization 0 Process B March 4 Miscellaneous 3 Process B March 4 Oxide Defect 7 Process B March 4 Silicon Defect 1 Process B March 5 Contamination 1 Process B March 5 Corrosion 3 Process B March 5 Doping 1 Process B March 5 Metallization 0 Process B March 5 Miscellaneous 1 Process B March 5 Oxide Defect 8 Process B March 5 Silicon Defect 2 run;
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