Procedure features: |
Data set generation
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Sample library member: |
GRRDATA
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Most of the GRADAR
procedure examples use the FAILURE data set.
You must submit this code before you can run any of the examples that use
the FAILURE data set.
During the manufacture of a metal-oxide semiconductor
(MOS) capacitor, different cleaning processes were used by two manufacturing
systems that were operating in parallel. Process A used a standard cleaning
solution, while Process B used a different cleaning mixture that contained
less particulate matter. For five consecutive days the causes of failure with
each process were observed, recorded, and saved in the SAS data set called
FAILURE.
data failure;
label Cause = "Cause of Failure" ;
input Process $ 1-9 Day $ 13-19 Cause $ 23-36 Count 40-41;
datalines;
Process A March 1 Contamination 15
Process A March 1 Corrosion 2
Process A March 1 Doping 1
Process A March 1 Metallization 2
Process A March 1 Miscellaneous 3
Process A March 1 Oxide Defect 8
Process A March 1 Silicon Defect 1
Process A March 2 Contamination 16
Process A March 2 Corrosion 3
Process A March 2 Doping 1
Process A March 2 Metallization 3
Process A March 2 Miscellaneous 1
Process A March 2 Oxide Defect 9
Process A March 2 Silicon Defect 2
Process A March 3 Contamination 20
Process A March 3 Corrosion 1
Process A March 3 Doping 1
Process A March 3 Metallization 0
Process A March 3 Miscellaneous 3
Process A March 3 Oxide Defect 7
Process A March 3 Silicon Defect 2
Process A March 4 Contamination 12
Process A March 4 Corrosion 1
Process A March 4 Doping 1
Process A March 4 Metallization 0
Process A March 4 Miscellaneous 0
Process A March 4 Oxide Defect 10
Process A March 4 Silicon Defect 1
Process A March 5 Contamination 23
Process A March 5 Corrosion 1
Process A March 5 Doping 1
Process A March 5 Metallization 0
Process A March 5 Miscellaneous 1
Process A March 5 Oxide Defect 8
Process A March 5 Silicon Defect 2
Process B March 1 Contamination 8
Process B March 1 Corrosion 2
Process B March 1 Doping 1
Process B March 1 Metallization 4
Process B March 1 Miscellaneous 2
Process B March 1 Oxide Defect 10
Process B March 1 Silicon Defect 3
Process B March 2 Contamination 9
Process B March 2 Corrosion 0
Process B March 2 Doping 1
Process B March 2 Metallization 2
Process B March 2 Miscellaneous 4
Process B March 2 Oxide Defect 9
Process B March 2 Silicon Defect 2
Process B March 3 Contamination 4
Process B March 3 Corrosion 1
Process B March 3 Doping 1
Process B March 3 Metallization 0
Process B March 3 Miscellaneous 0
Process B March 3 Oxide Defect 10
Process B March 3 Silicon Defect 1
Process B March 4 Contamination 2
Process B March 4 Corrosion 2
Process B March 4 Doping 1
Process B March 4 Metallization 0
Process B March 4 Miscellaneous 3
Process B March 4 Oxide Defect 7
Process B March 4 Silicon Defect 1
Process B March 5 Contamination 1
Process B March 5 Corrosion 3
Process B March 5 Doping 1
Process B March 5 Metallization 0
Process B March 5 Miscellaneous 1
Process B March 5 Oxide Defect 8
Process B March 5 Silicon Defect 2
run;
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